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Altatech Product Announcement - 10-6-2008
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Altatech Introduces Advanced Materials CVD and ALD Tool
AltaCVD®’s unique vaporizing technology offers unprecedented
new materials deposition capability
AltaCVD® will be shown
for the first time at SEMICON Europa 2008 - Booth 1366 October 7-9,
New Stuttgart Messe, Germany
Grenoble-Monbonnot, France,
October 6, 2008 – Altatech Semiconductor, a global provider
of advanced processes and manufacturing equipments for the semiconductor
industry today announced the launch of AltaCVD(®, an advanced materials
CVD (Chemical vapor deposition) and ALD (Atomic layer deposition) tool.
Based on Altatech’s breakthrough vaporizing technology enabling the
deposition from new, viscous and non-volatiles precursors, AltaCVD®
offers unique new capabilities to R&D facilities and pilot productions
lines.
AltaCVD® combines a unique vaporizer technology, chamber
design and gas/liquid panel integration. The combination of a proprietary
reactor design and precursor introduction path with a pulsed liquid
injection and vaporization enables nanoscale control of thickness, uniformity,
composition and stoichiometry in complex materials. These depositions
are unavailable today with existing techniques.
AltaCVD® is ideally
suited for the plasma-enhanced MOCVD and ALD processes of a wide range
of materials used in logic and memory devices as well as in microsystems
and 3D integration, such as : high-K gate dielectrics, metal electrodes,
high-K coupling dielectrics and electrodes in MIM and DRAM capacitors,
ferroelectric materials, chalcogenide alloys for PCRAM, seedless and
self-forming copper diffusion barriers, copper seed layers, transparent
conductive oxides, thin film batteries electrodes and electrolyte.
« The unique design and technology of AltaCVD® is in line with
Altatech’s product strategy aiming at accelerating the introduction
of next materials generation in the semiconductor chain. » says Hervé
Monchoix Altatech Technology Director. « With AltaCVD®, we offer
the best-in-class, flexible nanodeposition tool to advanced R&D
facilities’ teams. »
To date, multiple beta versions of
AltaCVD® systems have already been installed for advanced high-K gate
dielectric integration at front-end-of-line R&D facilities and for
through-silicon-via (TSV) metallization at a back-end-of-line R&D
facility.
About Altatech Altatech is a global
provider of advanced processes and manufacturing equipments for the
semiconductor industry and nanotechnologies. The product range includes
Nanovision with AltaSight® (Inspection), Nanoprinting with AltaDrop®
(Inkjet equipment), Nanodeposition with AltaCVD®. Besides its own tools,
Altatech’s reengineering activity offers its customers remanufactured
production tools. Altatech was founded in 2003 and is headquartered
in Grenoble-Montbonnot with subsidiary office in Germany and distributor
in Japan.
For more information, please visit :
www.altatech-sc.com
Contacts Altatech: Jean-Luc Delcarri,
CEO Phone: +33 456 526 800 email :
jeanluc.delcarri@altatech-sc.com
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